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多脉冲EUV诱导氢等离子体的PIC-漂移扩散混合模型数值模拟研究*

张宇强, 余新刚   

  1. 中国科学院大学工程科学学院,北京 100049
  • 收稿日期:2024-04-12 修回日期:2024-05-14 发布日期:2024-06-04
  • 通讯作者: E-mail: xgyu@ucas.ac.cn
  • 基金资助:
    *国家自然科学基金面上项目(12172356)和中国科学院青年交叉团队项目资助

Numerical simulation study of PIC-drift-diffusion hybrid model for multi-pulse EUV-induced hydrogen plasma

ZHANG Yuqiang, YU Xingang   

  1. School of Engineering Science, University of Chinese Academy of Sciences, Beijing 100049, China
  • Received:2024-04-12 Revised:2024-05-14 Published:2024-06-04

摘要: 基于PIC-漂移扩散混合模型,开发了适用于EUV诱导等离子体的二维柱坐标混合模型计算程序,该混合模型充分考虑了EUV诱导等离子体的特点,采用PIC方法跟踪离子的运动过程,采用漂移扩散模型处理快速进入准平衡态的电子。基于该混合模型,模拟了多脉冲EUV诱导H等离子体的长时间动态演化过程。结果表明,该混合模型可以准确地描述等离子体的动力学行为,同时还可以显著提高计算效率,扩大可模拟的时间尺度。等离子体的演化呈现出一定的累积效应,随着EUV脉冲数量的增加,H等离子体的平均密度逐渐上升,电子的平均动能逐渐下降,到达壁面的H离子通量逐渐增加,所有这些参数在脉冲数达到数值后趋于稳定。此外,背景气体的压力对于多脉冲累积效应具有显著影响,随着背景气体压力的增加,等离子体参数需要更多的脉冲达到稳定状态。

关键词: 极紫外光刻, EUV诱导等离子体, 多脉冲, 混合模型

Abstract: Based on the PIC-drift-diffusion hybrid model, a two-dimensional column-coordinate hybrid model computational procedure suitable for EUV-induced plasma has been developed, which fully takes into account the characteristics of EUV-induced plasma, and adopts the PIC method to track the motion process of ions, and adopts the drift-diffusion model to deal with electrons rapidly entering the quasi-equilibrium state. Based on this hybrid model, the long-time dynamic evolution of multi-pulse EUV-induced H plasma is simulated. The results show that the hybrid model can accurately describe the dynamical behavior of the plasma, and also significantly improve the computational efficiency and expand the time scale. The plasma evolution shows a certain cumulative effect, with the increase of the number of EUV pulses, the average density of the H plasma gradually rises, the average kinetic energy of the electrons gradually decreases, and the flux of H ions reaching the wall gradually increases, all of which parameters tend to stabilize after the number of pulses reaches a value. In addition, the pressure of the background gas has a significant effect on the multi-pulse cumulative effect, and the plasma parameters require more pulses to reach a steady state as the background gas pressure increases.

Key words: extreme ultraviolet lithography, EUV-induced plasma, multi-pulse, hybrid simulation

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