Welcome to Journal of University of Chinese Academy of Sciences,Today is

Journal of University of Chinese Academy of Sciences

Previous Articles     Next Articles

Numerical simulation study of PIC-drift-diffusion hybrid model for multi-pulse EUV-induced hydrogen plasma

ZHANG Yuqiang, YU Xingang   

  1. School of Engineering Science, University of Chinese Academy of Sciences, Beijing 100049, China
  • Received:2024-04-12 Revised:2024-05-14

Abstract: Based on the PIC-drift-diffusion hybrid model, a two-dimensional column-coordinate hybrid model computational procedure suitable for EUV-induced plasma has been developed, which fully takes into account the characteristics of EUV-induced plasma, and adopts the PIC method to track the motion process of ions, and adopts the drift-diffusion model to deal with electrons rapidly entering the quasi-equilibrium state. Based on this hybrid model, the long-time dynamic evolution of multi-pulse EUV-induced H plasma is simulated. The results show that the hybrid model can accurately describe the dynamical behavior of the plasma, and also significantly improve the computational efficiency and expand the time scale. The plasma evolution shows a certain cumulative effect, with the increase of the number of EUV pulses, the average density of the H plasma gradually rises, the average kinetic energy of the electrons gradually decreases, and the flux of H ions reaching the wall gradually increases, all of which parameters tend to stabilize after the number of pulses reaches a value. In addition, the pressure of the background gas has a significant effect on the multi-pulse cumulative effect, and the plasma parameters require more pulses to reach a steady state as the background gas pressure increases.

Key words: extreme ultraviolet lithography, EUV-induced plasma, multi-pulse, hybrid simulation

CLC Number: